Global-in-time Spectral Duhamel-Picard Method for Post-Exposure Bake Simulation and Physics-Informed Neural Operators for EUV Lithography
The method introduces a global-in-time spectral Duhamel–Picard approach to simulate complex chemical reactions during Post-Exposure Bake (PEB) in lithography. It reformulates reaction-diffusion equations into integral equations solved via polynomial expansions and Anderson acceleration, avoiding slow sequential time marching. This is extended into a Physics-Informed Neural Operator (PINO) for fast, time-marching-free prediction of concentration fields.