The day in conversation for 2026-10-28
discussion
Transcript
The discussion: Kai: I'm still processing how robust those FDTD simulations were; they accurately capturing the polarization conversion efficiency based on twist angle suggests that our initial structural assumptions about the strain profile might be surprisingly accurate for this geometry. Mira: That accuracy is good, but does that fidelity hold up when we consider fabrication tolerances? We achieved ninety-five percent DoCP with an optimized setup, but how sensitive is that high efficiency to the actual layer thickness variations we encounter in a standard deposition process versus the ideal model used in the simulation? Lev: If we look at the twist angle dependence, it seems like a critical parameter; I wonder if that sensitivity implies we can design components with tighter tolerance windows than previously thought, assuming the interface quality between ReSe2 and alpha-MoO3 remains consistent. Kai: Exactly
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